NANOTECH, The Republic of Korea - Komachine Supplier Profile and Product List

- A technology-oriented venture specializing in the development of sensor products utilizing optical and plasma diagnostic technologies, supplying critical diagnostic sensors for semiconductor and display mass production processes both domestically and internationally.A technology-oriented venture specializing in the development of sensor products utilizing optical and plasma diagnostic technologies, supplying critical diagnostic sensors for semiconductor and display mass production processes both domestically and internationally.
- SPOES (AEGIS Series): Self-Plasma OES sensor product line for real-time leak detection, dry clean endpoint detection, and endpoint detection in non-plasma etch and TSV etch processes in semiconductor and display manufacturing chambers. Features a patented contamination-free module, ensuring high contamination durability and cost-effectiveness compared to imported alternatives.SPOES (AEGIS Series): Self-Plasma OES sensor product line for real-time leak detection, dry clean endpoint detection, and endpoint detection in non-plasma etch and TSV etch processes in semiconductor and display manufacturing chambers. Features a patented contamination-free module, ensuring high contamination durability and cost-effectiveness compared to imported alternatives.
- CCD Type EPD (OPTI Series): Sensors for spectroscopic analysis of plasma inside semiconductor and FPD manufacturing process chambers, enabling automatic endpoint detection and process change monitoring for etch, plasma treatment, PR/ACL strip, and PECVD processes. Characterized by a stable system structure, diverse data processing algorithms, and a wide product lineup based on optical resolution, S/N ratio, and distributed processing architecture. Also offers OPTI-W products for wet processes.CCD Type EPD (OPTI Series): Sensors for spectroscopic analysis of plasma inside semiconductor and FPD manufacturing process chambers, enabling automatic endpoint detection and process change monitoring for etch, plasma treatment, PR/ACL strip, and PECVD processes. Characterized by a stable system structure, diverse data processing algorithms, and a wide product lineup based on optical resolution, S/N ratio, and distributed processing architecture. Also offers OPTI-W products for wet processes.
- Filter Type EPD (NEFL Series): Sensors designed to detect changes in etchants or by-products by receiving plasma light within semiconductor ash/strip chambers, thereby identifying the endpoint of etching processes. Primarily used in PR/ACL strip processes.Filter Type EPD (NEFL Series): Sensors designed to detect changes in etchants or by-products by receiving plasma light within semiconductor ash/strip chambers, thereby identifying the endpoint of etching processes. Primarily used in PR/ACL strip processes.
- Chamber Plasma Monitor: Sensor solutions for arc detection, pulsed plasma property analysis, and intensity distribution measurement.Chamber Plasma Monitor: Sensor solutions for arc detection, pulsed plasma property analysis, and intensity distribution measurement.
- Possession of proprietary sensor product development capabilities based on advanced optical and plasma diagnostic technologies.Possession of proprietary sensor product development capabilities based on advanced optical and plasma diagnostic technologies.
- Over 10 years of self-developed technology and expertise in localizing semiconductor, light source, optical measurement, and optical communication equipment.Over 10 years of self-developed technology and expertise in localizing semiconductor, light source, optical measurement, and optical communication equipment.
- Patented contamination-free module in SPOES products and in-situ leak detection technology, offering superior contamination durability and cost efficiency compared to imported products.Patented contamination-free module in SPOES products and in-situ leak detection technology, offering superior contamination durability and cost efficiency compared to imported products.
- Establishment of strong customer trust through excellent quality, high price competitiveness, and prompt service delivery.Establishment of strong customer trust through excellent quality, high price competitiveness, and prompt service delivery.
- Provision of customized services tailored to unique customer environments, backed by extensive experience, advanced technical support, and data analysis capabilities.Provision of customized services tailored to unique customer environments, backed by extensive experience, advanced technical support, and data analysis capabilities.
- Government recognition for technological competitiveness and growth potential, including designation as an Excellent New Technology (IT) company by the Ministry of Information and Communication and an Excellent Technology Competitiveness Company by the Small and Medium Business Administration.Government recognition for technological competitiveness and growth potential, including designation as an Excellent New Technology (IT) company by the Ministry of Information and Communication and an Excellent Technology Competitiveness Company by the Small and Medium Business Administration.
- Semiconductor manufacturing processes: Monitoring and control of CVD, ALD, Etch, Diffusion, Anneal, and PECVD processes.Semiconductor manufacturing processes: Monitoring and control of CVD, ALD, Etch, Diffusion, Anneal, and PECVD processes.
- Display manufacturing processes: Diagnosis and control of BP (Array), TSP, EN, and All TC/HC processes.Display manufacturing processes: Diagnosis and control of BP (Array), TSP, EN, and All TC/HC processes.
- Plasma treatment processes: Endpoint detection and monitoring for etching, plasma treatment, and PR/ACL strip processes.Plasma treatment processes: Endpoint detection and monitoring for etching, plasma treatment, and PR/ACL strip processes.
- Through Silicon Via (TSV) etch processes: Endpoint detection in BOSCH processes.Through Silicon Via (TSV) etch processes: Endpoint detection in BOSCH processes.
- South KoreaSouth Korea
- USAUSA
- Corporate R&D Center Certification.Corporate R&D Center Certification.
- Venture Company Certification.Venture Company Certification.
- Innovation-Biz (INNO-BIZ) Certification for Small and Medium Enterprises.Innovation-Biz (INNO-BIZ) Certification for Small and Medium Enterprises.
- ISO 9001 (Quality Management) and ISO 14001 (Environmental Management) Certifications.ISO 9001 (Quality Management) and ISO 14001 (Environmental Management) Certifications.
- ISO 45001 and ISO 22301 Certifications.ISO 45001 and ISO 22301 Certifications.
- Designation as an Excellent New Technology by the Ministry of Information and Communication (1997).Designation as an Excellent New Technology by the Ministry of Information and Communication (1997).
- Designation as an Excellent Technology Competitiveness Company by the Small and Medium Business Administration (2001).Designation as an Excellent Technology Competitiveness Company by the Small and Medium Business Administration (2001).
- Prime Minister's Award at the 5th Industry-Academia Cooperation Industrial Technology Exhibition (2005).Prime Minister's Award at the 5th Industry-Academia Cooperation Industrial Technology Exhibition (2005).
- Awarded the Three Million Dollar Export Tower (2020).Awarded the Three Million Dollar Export Tower (2020).
- Designation as a Specialized Material, Component, and Equipment Company (2021) and a Leading Material, Component, and Equipment Company (2022).Designation as a Specialized Material, Component, and Equipment Company (2021) and a Leading Material, Component, and Equipment Company (2022).
- Patent ownership related to the contamination-free module for SPOES products.Patent ownership related to the contamination-free module for SPOES products.
- Patent application for a digital automatic crack measurement device and patent registration for a step gauge (2025).Patent application for a digital automatic crack measurement device and patent registration for a step gauge (2025).